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晶體結(jié)構(gòu)扣除溶劑后在論文中的描述

2023-10-18 14:06 作者:DJ_Tokyo  | 我要投稿

有小伙伴向筆者提了如下問題:

想請教您一個問題,我們單晶包裹溶劑的話,用的都是squeeze,討論的結(jié)構(gòu)都是去溶劑之后的,但是審稿人給出這個意見是什么意思呢?

The word 'squeeze' or 'mask' also does not appear in the MS. The chemical formula for this material?(and the other one) is also missing from the MS.

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從問題描述來看,提問者的晶體數(shù)據(jù),用軟件將結(jié)構(gòu)中的溶劑去除了,也就是“squeeze”(擠出)或“mask”(遮掩),然而并沒有在論文中對這一操作進(jìn)行說明。

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與此相關(guān)的還有審稿意見:

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For the solvent masking, you must report the masked species in the moiety formula and add their atoms to the sum formula. [ solvents] is not acceptable, the square brackets should contain the solvents that were masked.

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該審稿意見處理相關(guān)視頻:https://www.bilibili.com/video/BV1Td4y1475w

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上述兩個審稿意見所表達(dá)的意思差不多,作者提交的晶體數(shù)據(jù)做了去除溶劑貢獻(xiàn)的操作,但無論是在論文正文、支撐信息還是晶體數(shù)據(jù)中,均未對這一操作做任何相關(guān)說明。如果晶體數(shù)據(jù)執(zhí)行了去除溶劑貢獻(xiàn)的操作,則通常需要回答這些問題:

(1)溶劑貢獻(xiàn)的扣除原因?

(2)溶劑貢獻(xiàn)的扣除種類?

(3)溶劑貢獻(xiàn)的扣除數(shù)量?

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此處的溶劑不單單特指溶劑,也可以是離子等。

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扣除溶劑可采用PLATON[1]中的SQUEEZE[2]程序或Olex2[3]中的Solvent Mask[4]程序來執(zhí)行。操作步驟可參閱推文“去除無序溶劑對計算結(jié)構(gòu)因子的貢獻(xiàn)”。

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案例1CrystEngComm,?2017,?19, 4709–4712.?(DOI: 10.1039/C7CE00849J. CCDC: 1545666)

該案例中,在論文正文對此做了說明,由于抗衡離子質(zhì)子化的胺(3,5-dimethylpiperidine(3,5-二甲基哌啶)——扣除物種)無序嚴(yán)重(扣除原因),故而使用SQUEEZE將其扣除,最后在確定的分子式中給出了扣除數(shù)量(且補充了另外的物種水分子及其數(shù)量),如圖1.1所示。(此處扣除的不是溶劑,而是抗衡離子。)

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▲圖1.1 案例1正文對溶劑扣除的描述


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其不對稱單元(ASU)如圖1.2所示,ASU中沒有任何CHNO等原子,應(yīng)是手動在CIF文件中“_chemical_formula_sum”項添加了這些原子及其數(shù)量,不過并未編輯“_chemical_formula_moiety”項,如圖1.3所示。

▲圖1.2 案例1結(jié)構(gòu)


▲圖1.3 案例1的CIF文件分子式相關(guān)內(nèi)容


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案例2Sci. China Chem.?2023,?66, 117–126.?(DOI: 10.1007/s11426-022-1396-x. CCDC: 2152634)

該案例中,在支撐信息中對此做了說明,如2.1所示,由于一個(扣除數(shù)量)游離的溶劑分子甲苯(扣除種類)嚴(yán)重?zé)o序(扣除原因),故使用Solvent Mask將其扣除。

▲圖2.1 案例2支撐信息對溶劑扣除的描述


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案例3Dalton Trans.?2020,?49, 8933–8948. (DOI: 10.1039/D0DT00729C. CCDC: 1936173)

該案例中,在論文正文對此做了說明,如圖3.1所示,由于抗衡離子K+和水分子(扣除種類)無序嚴(yán)重(扣除原因),故使用Solvent Mask將其扣除,并將12個K+和44個水(扣除數(shù)量)添加到分子式中。

▲圖3.1 案例3正文對溶劑扣除的描述


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其結(jié)構(gòu)和Solvent Mask情況如圖3.2所示,Solvent Mask計算結(jié)果是在約3498 ?3體積中扣除了約617個電子,作者根據(jù)電荷平衡、元素分析、熱重分析等,推測扣除的物種是44個水(電子數(shù):44 ×?10 = 440)和12個K+(電子數(shù):12 ×?18 = 216),總計為440 + 216 = 656。

▲圖3.2 案例3結(jié)構(gòu)(水分子未加氫,有些未作各向異性精修)


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其CIF文件中分子式如圖3.3所示,“_chemical_formula_moiety”項中有2個K,加上推測的12個K,共14個K,這和“_chemical_formula_sum”中K的數(shù)量對應(yīng);“_chemical_formula_moiety”項中的15(O),應(yīng)該是15個水,加上推測的44個水,共計59個水,也就是118個H和59個O,氧的數(shù)量為177 + 59 = 236,這和“_chemical_formula_sum”中O的數(shù)量對應(yīng),然而氫的數(shù)量為31 + 118 = 149,這和“_chemical_formula_sum”中H的數(shù)量170無法對應(yīng),不知是作者手動編輯輸入錯誤,還是其他原因。

▲圖3.3 案例3的CIF文件分子式相關(guān)內(nèi)容


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一些相關(guān)審稿意見:

例1

1. The investigation shows that there is not ethanol/water solvent, but most likely two disordered ethanol molecules. However, exact localization of these molecules at room temperature is very problematic even for experts.

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I obtained R-factor 5.4% with two disordered ethanol molecules.

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2. I generally do not support use of SQUEEZE procedure, but in this particular case I would recommend you to do so and use solvent mask.

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This way, I obtained R-factor 4.5%

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3. Please, re-refine the structure either using disordered solvent model or using solvent mask procedure.

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4. The structure represents bis-ethanol solvate, no water here, please make corrections.

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5. If you decide to go with the solvent mask, this must be explicitly stated in the paper

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6. I see your description of hydrogen bonds is wrong. Please, check carefully and make corrections.

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7. The rest of my criticisms from the previous letter applies. I apologize for losing your res and hkl files.

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例2

There are two cyanide ions in the solvent sphere -- but these are not mentioned in the text. Where do they come from?

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If you are not particularly interested in the solvent sphere, I recommend using a solvent mask for these moieties and concentrate on getting the best model of the main molecule.

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I attach a refinement with an R1 of 4.17% (down from 8.22%). I have masked everything in the solvent sphere (and assumed it is all water) and have modelled the disorder that is obvious in one part of the main molecule. Please have a look at this structure and take it from there.

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參考文獻(xiàn)

[1]?(a) Spek, A. L. Single-crystal structure validation with the program?PLATON.?J.?Appl.?Cryst.?2003,?36, 7–13. (b) Spek, A. L. Structure validation in chemical crystallography.?Acta?Cryst.?2009,?D65, 148–155. (c) Spek, A. L. What makes a crystal structure report valid??Inorg.?Chim.?Acta?2018,?470, 232–237. (d) Spek, A. L.?checkCIF?validation ALERTS: what they mean and how to respond.?Acta Cryst.?2020,?E76, 1–11.

[2]?Spek, A. L.?PLATON SQUEEZE: a tool for the calculation of the disordered solvent contribution to the calculated structure factors.?Acta Cryst.?2015,?C71, 9?18.

[3]?Dolomanov, O. V.; Bourhis, L. J.; Gildea, R. J.; Howard, J. A. K.; Puschmann, H.?OLEX2: A complete structure solution, refinement and analysis program.?J. Appl. Cryst.?2009,?42, 339?341.

[4]?Rees, B.; Jenner, L.; Yusupov, M. Bulk-solvent correction in large macromolecular Structures.?Acta Cryst.?2005,?D61, 1299?1301.


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